CO2 laser annealing with NiTi thin films deposited by sputtering

Miyamoto, Isamu, He, Q., Huang, Wei Min, Hong, Minhui, Chong, Tow Chong, Fu, Yong Qing, Du, Hejun, Ostendorf, Andreas, Sugioka, Koji and Helvajian, Henry (2003) CO2 laser annealing with NiTi thin films deposited by sputtering. Proceedings of SPIE, 5063. pp. 319-322. ISSN 0277-786X

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Official URL: http://dx.doi.org/10.1117/12.540464

Abstract

It has been proved that NiTi shape memory alloy thin film is the best one for micro actuators as compared with the others, e.g., electrostatic, electromagnetic and piezoelectric thin films. If the deposition of NiTi thin films on silicon wafers is carried out at room temperature, the resultant thin films are normally amorphous without shape memory. Subsequent annealing in a high vacuum chamber is required for re-crystallization. In this paper, we present an alternative annealing approach, namely by CO2 laser. After laser annealing, optical microscope, X-ray diffraction (XRD) and atomic force microscope (AFM) were applied to characterize the NiTi thin films. Strong austenite/martensite lattice structures were observed by XRD. The relationship between the surface roughness of the annealed NiTi thin film and temperature was obtained using AFM. The results indicate that the CO2 laser annealed NiTi thin films are with shape memory.

Item Type: Article
Subjects: F200 Materials Science
Department: Faculties > Engineering and Environment > Physics and Electrical Engineering
Depositing User: Becky Skoyles
Date Deposited: 26 Mar 2015 11:37
Last Modified: 03 Feb 2017 12:30
URI: http://nrl.northumbria.ac.uk/id/eprint/21798

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