Patterning of diamond microstructures on Si substrate by bulk and surface micromachining

Fu, Yong Qing, Du, Hejun and Miao, Jianmin (2003) Patterning of diamond microstructures on Si substrate by bulk and surface micromachining. Journal of Materials Processing Technology, 132 (1-3). pp. 73-81. ISSN 0924-0136

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Abstract

In this paper, diamond microstructures were patterned over silicon/silicon dioxide substrate using the processes combined with bulk or surface micromachining, selective growth of diamond and plasma etching technique. Polycrystalline diamond films were prepared using microwave plasma enhanced chemical vapour deposition (MW-PECVD) and a gas mixture of hydrogen and methane. Two types of techniques for precise patterning of diamond microstructures were investigated in this paper. The first one was to selectively grow diamond films in the desired region by pre-depositing a Pt interlayer on silicon dioxide layer. The second one was to selectively etch the deposited diamond film in oxygen/argon plasma under an Al mask. Different microstructures, e.g., microgear, microrotor, comb drive structure, etc. were successfully fabricated.

Item Type: Article
Uncontrolled Keywords: Diamond; Microstructures; Selective deposition; Reactive ion etching; MEMS
Subjects: F200 Materials Science
Department: Faculties > Engineering and Environment > Physics and Electrical Engineering
Depositing User: Becky Skoyles
Date Deposited: 26 Mar 2015 12:45
Last Modified: 10 Aug 2015 11:38
URI: http://nrl.northumbria.ac.uk/id/eprint/21815

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