TiO 2 films prepared using plasma ion assisted deposition for photocatalytic application

Zhao, C., Child, D., Gibson, D., Placido, F. and Fu, Yong Qing (2014) TiO 2 films prepared using plasma ion assisted deposition for photocatalytic application. Materials Research Bulletin, 60. pp. 890-894. ISSN 0025-5408

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Official URL: https://doi.org/10.1016/j.materresbull.2014.09.022

Abstract

Anatase TiO2 films were synthesized on glass substrates using a plasma ion assisted deposition (PIAD) without external heating or subsequent annealing. The low temperature PIAD process produced crystalline anatase films with increased hardness and Young’s modulus, reduced film surface roughness and improved optical properties compared with those deposited without ion assistance, as well as a possibility to be applied to a wider range of substrates. Photocatalytic characterization showed that significant increases in photocatalytic stability and efficiency were achieved after using the PIAD process, although surface roughness and porosity of the films decreased slightly.

Item Type: Article
Uncontrolled Keywords: Thin films, Plasma deposition, X-ray diffraction, Electron microscopy, Crystal structure, Catalytic properties
Subjects: F200 Materials Science
Department: Faculties > Engineering and Environment > Mathematics, Physics and Electrical Engineering
Depositing User: Becky Skoyles
Date Deposited: 29 Jan 2018 15:24
Last Modified: 29 Jan 2018 15:24
URI: http://nrl.northumbria.ac.uk/id/eprint/33207

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