Nanometer scale patterning using focused ion beam milling

Petit, D., Faulkner, C. C., Johnstone, S., Wood, David and Cowburn, R. P. (2005) Nanometer scale patterning using focused ion beam milling. Review of Scientific Instruments, 76 (2). 026105. ISSN 0034-6748

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We report on the performance of focused ion beam (FIB) milling in order to produce nanometer scale devices. Resolution issues have been systematically studied as a function of emission current and working distance, by imaging single pixel lines FIB milled into thin bismuth films deposited on oxidized silicon. The ion beam profile has been measured, and by carefully optimizing the milling conditions, 40 nm Hall probe sensors have been fabricated.

Item Type: Article
Subjects: F200 Materials Science
H900 Others in Engineering
Department: Faculties > Engineering and Environment > Geography and Environmental Sciences
Depositing User: Becky Skoyles
Date Deposited: 29 Mar 2018 14:06
Last Modified: 11 Oct 2019 21:18

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