Comparison of Conventional and Maskless Lithographic Techniques for More than Moore Post-processing of Foundry CMOS Chips

Andreas Tsiamis, Andreas Tsiamis, Li, Yifan, Dunare, Camelia, Marland, Jamie, Blair, Ewen, Smith, Stewart, Terry, Jonathan G., Mitra, Srinjoy, Underwood, Ian, Murray, Alan and Walton, Anthony J. (2020) Comparison of Conventional and Maskless Lithographic Techniques for More than Moore Post-processing of Foundry CMOS Chips. Journal of Microelectromechanical Systems. ISSN 1057-7157 (In Press)

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Official URL: https://doi.org/10.1109/jmems.2020.3015964

Abstract

This article details and compares the technology options for post-processing foundry produced CMOS at chip-scale to enable More than Moore functionality. In many cases there are attractions in using chip-based processing through the Multi-Project Wafer route that is frequently employed in research, early-stage development and low-volume production. This article identifies that spray-based photoresist deposition combined with optical maskless lithography demonstrates sufficient performance combined with low cost and operational convenience to offer an attractive alternative to conventional optical lithography, where spin-coated photoresist is exposed through a patterned photomask. [2020-0249]

Item Type: Article
Uncontrolled Keywords: CMOS, maskless, More than Moore, on-chip, optical lithography, photomask, post-processing, spin-coating, spray-coating.
Subjects: F200 Materials Science
Department: Faculties > Engineering and Environment > Mechanical and Construction Engineering
Depositing User: John Coen
Date Deposited: 06 Aug 2020 14:49
Last Modified: 27 Aug 2020 11:15
URI: http://nrl.northumbria.ac.uk/id/eprint/44016

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