Deep reactive ion etching as a tool for nanostructure fabrication

Fu, Yong Qing, Colli, Alan, Fasoli, Andrea, Luo, Jikui, Flewitt, Andrew, Ferrari, Andrea and Milne, William (2009) Deep reactive ion etching as a tool for nanostructure fabrication. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 27 (3). p. 1520. ISSN 1071 1023

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Abstract

Deep reactive ion etching (DRIE) is investigated as a tool for the realization of nanostructures and architectures, including nanopillars,siliconnanowires or carbon nanotubes on Si nanopillars, nanowalls, and nanonetworks. The potential of combining top-down fabrication methods with the bottom-up synthesis of one-dimensional nanocomponents is assessed. The field-emission properties of carbon nanotubes/Si pillars hybrid structures are measured, as well as the transport properties of large-area nanowires obtained via nanowire lithography. The potential of DRIE for the fabrication of three-dimensional nanostructures is also revealed.

Item Type:	Article
Subjects:	F200 Materials Science
Department:	Faculties > Engineering and Environment > Mathematics, Physics and Electrical Engineering
Depositing User:	Becky Skoyles
Date Deposited:	23 Mar 2015 09:55
Last Modified:	12 Oct 2019 19:06
URI:	http://nrl.northumbria.ac.uk/id/eprint/21661

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