In-situ synchrotron X-ray diffraction study of stress-induced phase transformation in Ti50.1Ni40.8Cu9.1 thin films

Wang, Hong, Sun, Guangai, Chen, Bo, Fu, Yong Qing, Wang, Xiaolin, Zu, Xiao-Tao, Shen, Hua Hai, Liu, Yanping, Li, Liangbin, Pan, Guoqiang, Sheng, Liusi and Tian, Q. (2012) In-situ synchrotron X-ray diffraction study of stress-induced phase transformation in Ti50.1Ni40.8Cu9.1 thin films. Physica B: Condensed Matter, 407 (17). pp. 3437-3440. ISSN 0921 4526

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Abstract

Stress-induced martensitic transformation of as-sputtered and post-annealed Ti50.1Ni40.8Cu9.1 thin films was investigated using in-situ synchrotron X-ray diffraction (S-XRD) technique. For the as-deposited film, in-situ S-XRD analysis showed a martensitic transformation from parent phase to martensite during initial loading, followed by reorientation of martensite variants via detwinning. This detwinning process induced a strong 〈0 2 0〉 fiber texture along the loading direction and a strong 〈0 0 2〉 fiber texture perpendicular to the loading direction. For the 650 °C annealed film, there is only elastic deformation, followed by a martensitic transformation during deformation.

Item Type:	Article
Uncontrolled Keywords:	Shape memory, Ti–Ni–Cu thin film, stress-induced phase transformation, detwinning, synchrotron X-ray diffraction
Subjects:	F200 Materials Science
Department:	Faculties > Engineering and Environment > Mathematics, Physics and Electrical Engineering
Depositing User:	Becky Skoyles
Date Deposited:	23 Mar 2015 11:28
Last Modified:	12 Oct 2019 19:07
URI:	http://nrl.northumbria.ac.uk/id/eprint/21691

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