Characterization of Ti-containing amorphous carbon films prepared on titanium substrates

Sheeja, D., Tay, Beng Kang, Sun, Chang Qing and Fu, Yong Qing (2003) Characterization of Ti-containing amorphous carbon films prepared on titanium substrates. Journal of Materials Science, 38 (3). pp. 421-425. ISSN 0022 2461

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Amorphous carbon (a:C) films prepared on pure titanium (Ti) substrates exhibit relatively high intrinsic compressive stress. In order to obtain low stress films with varied electrical and mechanical properties, metal (Ti) ions are incorporated into the plasma. This is done with the help of metal containing carbon targets. Amorphous carbon films with varied percentage of Ti were deposited on polished pure Ti substrates using Filtered Cathodic Vacuum Arc (FCVA) technique together with substrate pulse biasing. Characterizations of the films were carried out using various equipments including Raman Spectroscopy, X-ray diffractometer, Atomic Force Microscopy (AFM), Pin-on-Disk Tribometer and Micro-Scratch Tester; and properties such as microstructure, crystallography, film stress, morphology, frictional coefficient and critical load were investigated as a function of Ti content in the target. The results suggest that the film prepared with 5 at.% Ti-containing carbon target, under 7 kV substrate pulse bias voltage, displays almost zero stress. However such films are inferior in its Tribological properties compared to that of pure a:C films.

Item Type: Article
Subjects: F200 Materials Science
Department: Faculties > Engineering and Environment > Mathematics, Physics and Electrical Engineering
Depositing User: Becky Skoyles
Date Deposited: 26 Mar 2015 11:34
Last Modified: 12 Oct 2019 19:05

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