XPS characterization of surface and interfacial structure of sputtered TiNi films on Si substrate

Fu, Yong Qing, Du, Hejun, Zhang, Sam and Huang, Wei Min (2005) XPS characterization of surface and interfacial structure of sputtered TiNi films on Si substrate. Materials Science and Engineering: A, 403 (1-2). pp. 25-31. ISSN 0921 5093

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Abstract

TiNi films were prepared by co-sputtering TiNi and Ti targets. X-ray photoelectron spectroscopy (XPS) was employed to study surface chemistry of the films and interfacial structure of Si/TiNi system. Exposure of the TiNi film to the ambient atmosphere (23 °C and 80% relatively humidity) facilitated quick adsorption of oxygen and carbon on the surface. With time, carbon and oxygen content increased drastically at the surface, while oxygen diffused further into the layer. After a year, carbon content at the surface became as high as 65.57% and Ni dropped below the detection limit of XPS. Depth profiling revealed that significant inter-diffusion occurred between TiNi film and Si substrate with a layer of 90–100 nm. The detailed bond changes of different elements with depth were obtained using XPS and the formation of titanium silicides at the interface were identified.

Item Type:	Article
Uncontrolled Keywords:	TiNi; Thin film; Sputtering; Shape memory; XPS; Chemistry; Interface
Subjects:	F200 Materials Science
Department:	Faculties > Engineering and Environment > Mathematics, Physics and Electrical Engineering
Depositing User:	Becky Skoyles
Date Deposited:	27 Mar 2015 09:19
Last Modified:	12 Oct 2019 19:06
URI:	http://nrl.northumbria.ac.uk/id/eprint/21867

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