CFD Modelling of Cadmium Telluride (CdTe) Thin Film Coating with Inline AP-MOCVD

Wu, Yiyi, Yang, Xiao Gang, Huang, Xiao Bing, Barrioz, Vincent, Monir, Shafiul, Irvine, Stuart and Kartopu, Giray (2012) CFD Modelling of Cadmium Telluride (CdTe) Thin Film Coating with Inline AP-MOCVD. Applied Mechanics and Materials, 217-19. pp. 1265-1273. ISSN 1662-7482

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A CFD numerical model has been established to study the growth of cadmium telluride (CdTe) on substrate using metalorganic chemical vapour deposition technique in atmospheric pressure (AP-MOCVD) and hydrodynamics in an inline MOCVD reactor. The numerical simulations have been conducted using the CFD code – ANSYS Fluent. Dimethylcadmium (DMCd) and diisopropyltelluride (DIPTe) have been employed as precursors while H2 is acting as the carrier gas. In order to assess the effect of various conditions on CdTe film growth and uniformity, heat transfer and mass transport behaviours of the chemical species in the reactor have been fully investigated. In addition, material utilization and fluid dynamics in the reactor are also discussed.

Item Type: Article
Uncontrolled Keywords: AP-MOCVD, Cadmium Telluride, CFD Modelling, Fluid Dynamic, Thin Film Coatings
Subjects: F200 Materials Science
Department: Faculties > Engineering and Environment > Mathematics, Physics and Electrical Engineering
Depositing User: Becky Skoyles
Date Deposited: 23 Nov 2015 15:39
Last Modified: 12 Oct 2019 19:07

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