Haider, Julfikar and Hashmi, Mohammed (2010) Improving the deposition rate of multicomponent coating by controlling substrate table rotation in a magnetron sputtering process. Advanced Materials Research, 83-86. pp. 977-984. ISSN 1022-6680
Full text not available from this repository. (Request a copy)Abstract
Physical Vapour Deposition (PVD) technology, particularly magnetron sputtering process, enjoys the competitive advantages of depositing different new generation coatings (e.g., multicomponent, multilayer, graded, composite etc.) on three-dimensional objects (substrate) with excellent mechanical and tribological properties. In an industrial-scale sputtering chamber with a limited number of active magnetron sources (target) on the chamber wall, the density of coating species from different sources would not be uniform everywhere around the chamber. As a result, at a constant speed of rotating substrate table in a single revolution, the instantaneous deposition rate will be highest in front of the active targets and lowest when the substrate moves away from the active targets. In this work, a method of controlling the rotational speed (i.e., slower speed in front of active targets and faster speed in front of inactive targets in a revolution) of a substrate table installed in a magnetron sputtering chamber has been developed in order to improve the deposition rate of a multicomponent TiN+MoSx coating. The mechanical and tribological properties of TiN+MoSx coating have also been characterised to assess the beneficial effects of adding solid lubricant (MoS2) in hard TiN coating.
Item Type: | Article |
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Uncontrolled Keywords: | deposition rate, magnetron sputtering, substrate rotation |
Subjects: | H700 Production and Manufacturing Engineering |
Department: | Faculties > Engineering and Environment > Mathematics, Physics and Electrical Engineering |
Depositing User: | EPrint Services |
Date Deposited: | 30 Oct 2009 12:56 |
Last Modified: | 31 Jul 2021 08:38 |
URI: | http://nrl.northumbria.ac.uk/id/eprint/255 |
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