Laser trim pattern modelling and optimisation for CuAlMo thin film resistors

Birkett, Martin and Penlington, Roger (2013) Laser trim pattern modelling and optimisation for CuAlMo thin film resistors. IEEE Transactions on Components, Packaging and Manufacturing Technology, 3 (3). pp. 523-529.

Full text not available from this repository. (Request a copy)
Official URL:


The influence of varying laser trim patterns on the electrical performance of a novel CuAlMo thin film resistor material were investigated. The benefits and limitations of various trim geometries were considered before two patterns, the ‘L’ cut and serpentine cut, were selected to laser trim resistor samples to target values of 1 to 10 Ω, using previously optimized laser conditions. The effect of increasing trim gain and varying trim pattern on the stability and standard deviation of the films were then systematically investigated. A two stage trimming process was utilized to reduce resistance drift figures to < 0.1% following storage for 168 hours at 125 °C in air and also allowed much tighter resistance tolerances of < ±0.1% to be achieved.

Item Type: Article
Uncontrolled Keywords: laser trimming , process optimization , thin-film resistor
Subjects: H300 Mechanical Engineering
H700 Production and Manufacturing Engineering
Department: Faculties > Engineering and Environment > Mechanical and Construction Engineering
Depositing User: Dr Martin Birkett
Date Deposited: 08 Mar 2013 15:04
Last Modified: 13 Oct 2019 00:33

Actions (login required)

View Item View Item


Downloads per month over past year

View more statistics